NanoPORElution

NanoPORElution makes use of so-called nanosphere lithography in combination with thin etching masks to create nanopores in a variety of polymeric and metallic materials. Pores will be filled with agents in order to modulate tissue response and ingrowth behaviour of implants. While this technology was demonstrated already on planar surfaces, application with implants featuring complex topologies is not yet established. This project aims at the development of process technology and its application to coronary stents in collaboration with industrial partners.

The following tasks are comprised in the project at the NMI:
i) development of hybrid nanopatterning processes utilizing of self assembly of nanoparticles as shadow masks on arbitrarily formed implant surfaces, in particular consisting of metal (titanium, steel) and polymers
ii) nanopores with large, well-defined aspect ratio and tailored eluting kinetics
iii) Nanomasks: thin, etch resistant masking layers on implant surfaces, for transfer of nanopattern into implant surface using an-isotropic etching processes
iv) an-isotropic etching processes for metallic and polymeric materials. Particularly based on electrochemistry and plasma technology.
v) ultra-thin, biocompatible polymer coatings based on self-assembled polyelectrolyte coatings to tailor elution kinetics from nanopores.