People

Philipp Albrecht
Technical Assistant Interfaces and Nanoanalytics
T +49 (0)7121 51530-907
F +49 (0)7121 51530-62
Dr. Claus J. Burkhardt
Group Leader Nanoanalytics
T +49 (0)7121 51530-55
F +49 (0)7121 51530-62

Areas of activity
Nanotechnology, nanolithography with electron and ion beams, electron beam and ion beam induced material deposition (additive nanolithography), electron microscopy, development of preparation methods, thin film technology, microsystems technology

Stages of career
2018 - today Group Leader Applied Materials Science and Electron Microscopy

2008 - 2017 Group Leader Microsystems and Nanotechnology 

1998 - 2007 Research Associate at the NMI, Project Manager

1995 - 1997 Research assistant at the Hearing Research Centre Tübingen

1997   Doctorate at the University of Tübingen

1986 - 1992 Research Assistant, PhD Student, University of Tübingen, Institute of Applied Physics

1979 - 1986 Physics studies, University of Tübingen

Elvina Houas
Technical Assistant Interfaces and Nanoanalytics
T +49 (0)7121 51530-53
F +49 (0)7121 51530-62
Michael Huang
Scientist Interfaces and Nanoanalytics
T +49 (0)7121 51530-902
F +49 (0)7121 51530-62
Dr. Tarek Lutz
Group Leader Interfaces and Nanoanalytics
T +49 (0)7121 51530-900
F +49 (0)7121 51530-62

Stages of career

since 2012 NMI, Project leader Nano analytics, Head of NMI Nano analytic laboratory, Physicist
2007-2012 Senior experimental Officer, Marie-Curie senior research fellow (EU/FP7), CRANN/Trinity College, Dublin, Ireland
2005-2007 Staff engineer, Physicis, Qimonda, Dresden, Germany
2004-2005  Senior researcher, Physicist, Infineon, Cooperate Research (CPR) Munich, Germany
1999-2004  Senior engineer, Physicist, Infineon, Mask House, Munich, Germany
1997-1999  Physicist; Masterstudent, NMI Reutlingen,Germany
1997-1998  Kleindiek Nanotechnik, Reutlingen, Germany

Education:
2007-2012 Trinity College Dublin, Dublin, Ireland
- Contact interface studies of metal and carbon electrodes to germanium nanowires, carbon nanotubes and thin carbon films in associated devices”
- PHD Thesis conducted at the School of Physics at the Trinity College in Dublin (Ireland)
1997-1998 University of Tübingen, Tuebingen, Germany
- “Target preparation strategies using focused Ion beam technique (FIB) to investigate internal interfaces in Transmission Electron Microscopy”
-  Master Thesis conducted at the Bosch Research Center and the Natural and Medical Science Institute (NMI)
1998-1997 University of Tübingen, Tuebingen, Germany

Publications outside the NMI

Contact resistivity and suppression of Fermi level pinning in side-contacted germanium nanowires; MM Koleśnik-Gray, T Lutz, G Collins, S Biswas, JD Holmes, V Krstić; Applied Physics Letters 103 (15), 153101    9    2013

Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography;
S Rasappa, D Borah, CC Faulkner, T Lutz, MT Shaw, JD Holmes, ...; Nanotechnology 24 (6), 065503    22    2013

Contact Interface Studies of Metal and Carbon Electrodes to Germanium Nanowires, Carbon Nanotubes and Thin Carbon Films in Associated Devices; T Lutz; Trinity College Dublin        2013

Free-Standing, Single-Crystal Cu3Si Nanowires; SJ Jung, T Lutz, AP Bell, EK McCarthy, JJ Boland; Crystal Growth & Design 12 (6), 3076-3081    22    2012

Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly; RA Farrell, NT Kinahan, S Hansel, KO Stuen, N Petkov, MT Shaw, ...; Nanoscale 4 (10), 3228-3236    51    2012

Resolving In Situ Specific‐Contact, Current‐Crowding, and Channel Resistivity in Nanowire Devices: A Case Study with Silver Nanowires; MM Koleśnik, S Hansel, T Lutz, N Kinahan, M Boese, V Krstić; Small 7 (20), 2873-2877    11    2011

Anisotropic etching induced by surface energy driven agglomeration; S Jung Jung, T Lutz, JJ Boland; Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 29 (5 …    7    2011

Surface energy driven agglomeration and growth of single crystal metal wires; SJ Jung, T Lutz, M Boese, JD Holmes, JJ Boland; letters 11 (3), 1294-1299    13    2011

Nanoscale mapping of electrical resistivity and connectivity in graphene strips and networks; PN Nirmalraj, T Lutz, S Kumar, GS Duesberg, JJ Boland; Nano letters 11 (1), 16-22    91    2010

Transparent ultrathin conducting carbon films; M Schreiber, T Lutz, GP Keeley, S Kumar, M Boese, S Krishnamurthy, ...; Applied Surface Science 256 (21), 6186-6190    30    2010

An investigation of the electrical properties of pyrolytic carbon in reduced dimensions: Vias and wires; AP Graham, G Schindler, GS Duesberg, T Lutz, W Weber; Journal of Applied Physics 107 (11), 114316    22    2010

Transparent ultrathin conducting carbon films; M BOESE, GS DUESBERG, T LUTZ, S KUMAR; Applied Surface Science;        2010

Gas phase controlled deposition of high quality large-area graphene films; S Kumar, N McEvoy, T Lutz, GP Keeley, V Nicolosi, CP Murray, WJ Blau, ...; Chemical communications 46 (9), 1422-1424    44    2010

CVD Growth of Nanocarbons for Device Applications; N Mc Evoy, S Kumar, T Lutz, G Keeley, W Blau, G Duesberg; Meeting Abstracts, 2213-2213        2009

Low temperature graphene growth; S Kumar, N McEvoy, T Lutz, G Keeley, N Whiteside, W Blau, GS Duesberg; ECS Transactions 19 (5), 175-181    7    2009

One-and Two-Dimensional Carbon Nanostructures for applications in Microelectronic Devices and Electrochemical Sensors; G Keeley, T Lutz, N McEvoy, S Kumar, M Schreiber, N Whiteside, ...; Meeting Abstracts, 1313-1313        2009

Fabrication of all-Carbon Nanodevices; T Lutz, S Krishnamurthy, M Schreiber, G Keeley, GS Duesberg; Meeting Abstracts, 2135-2135        2008

Process for producing a mask; T Lutz, J Schneider; US Patent 7,410,732        2008

Integration of EBDW of one entire metal layer as substitution for optical lithography in 220 nm node microcontrollers; J Kretz, H Roeper, C Arndt, T Bischoff, KH Choi, G Goldbeck, M Gunia, ...; Microelectronic Engineering 85 (5-6), 792-795    9    2008

Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method; K Keil, KH Choi, C Hohle, J Kretz, T Lutz, L Bettin, M Boettcher, ...; Microelectronic Engineering 85 (5-6), 778-781    6    2008

Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications; C Hohle, C Arndt, KH Choi, J Kretz, T Lutz, F Thrum, K Keil; Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …    8    2007

Apparatus and method for determining physical properties of a mask blank; T Lutz, M Menath; US Patent 7,289,231        2007

CD control of direct versus complementary exposure for shaped beam writers and its correlation to the local registration error; F Thrum, KH Choi, T Lutz, C Hohle, C Arndt, M Tesauro, MT Bootsmann, ...; Microelectronic engineering 84 (5-8), 1033-1036    3    2007

Fabrication of a nano-scale NAND memory array based on a SONOS Fin-FET cell using e-beam lithography and hydrogen-silsesquioxane resist; T Lutz, M Specht, L Risch, C Friederich, L Dreeskornfeld, J Kretz, ...; Microelectronic engineering 84 (5-8), 1578-1580    7    2007

Defect inspection of positive and negative sub-60nm resist pattern printed with variable shaped E-Beam direct write lithography; C Arndt, C Hohle, J Kretz, T Lutz, M Richter, K Keil, M Lapidot, D Zemach, ...; Emerging Lithographic Technologies XI 6517, 651711        2007

Data preparation for EBDW; F Thrum, J Kretz, T Lutz, K Keil, C Arndt, KH Choi, U Baetz, N Belic, ...; Mask and Lithography Conference (EMLC), 2007 23rd European, 1-8    3    2007

Multi-level p+ tri-gate SONOS NAND string arrays; C Friederich, M Specht, T Lutz, F Hofmann, L Dreeskornfeld, W Weber, ...; Electron Devices Meeting, 2006. IEDM'06. International, 1-4    17    2006

Method for detecting and compensating for positional displacements in photolithographic mask units and apparatus for carrying out the method; J Schneider, T Lutz; US Patent 7,087,910    5    2006

Comparison of trimming techniques for sub-lithographic silicon structures; L Dreeskornfeld, AP Graham, J Hartwich, J Kretz, E Landgraf, T Lutz, ...; Japanese journal of applied physics 45 (6S), 5552    5    2006

Influence of crystal orientation and body doping on trigate transistor performance; E Landgraf, W Rösner, M Städele, L Dreeskornfeld, J Hartwich, ...; Solid-state electronics 50 (1), 38-43    46    2006

Comparison of trimming techniques for sub-lithographic silicon structures; L Dreeskornfeld, AP Graham, J Hartwich, E Landgraf, T Lutz, W Rosner, ...; Microprocesses and Nanotechnology Conference, 2005 International, 152-153        2005

Method for compensating for scatter/reflection effects in particle beam lithography; C Ebi, F Erber, T Franke, F Gans, T Lutz, G Ruhl, B Schönherr; US Patent 6,953,644    1    2005

Planar double gate transistors with asymmetric independent gates; G Ilicali, W Weber, W Rosner, L Dreeskornfeld, J Hartwich, J Kretz, T Lutz, ...; SOI Conference, 2005. Proceedings. 2005 IEEE International, 126-127    10    2005

Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20 nm MOSFET device demonstrators; J Kretz, L Dreeskornfeld, G Ilicali, T Lutz, W Weber; Microelectronic engineering 78, 479-483    19    2005

Investigation of Low Damage Mask Repair by Combination of Electron Beam and Scanning Force Technology; C Burkhardt, S Bauerdick, V Bucher, W Barth, A Ehrmann, T Lutz, J Rau, ...; Micro and Nano Engineering    1    2002

FOx-12 flowable oxide ; L Dreeskornfeld, AP Graham, J Hartwich, J Kretz, E Landgraf, T Lutz, ...;

Proc. Micro-and Nano Engineering 2005 Proc. Micro-and Nano Engineering 2005, 2005; L Dreeskornfeld, AP Graham, J Hartwich, J Kretz, E Landgraf, T Lutz, ...

IEDM Tech. Dig., 2004 IEDM Tech. Dig., 2004, 2004; L Dreeskornfeld, AP Graham, J Hartwich, J Kretz, E Landgraf, T Lutz, ...

Dr. Wilfried Nisch
Scientist Nanoanalytics
T +49 (0)7121 51530-40
F +49 (0)7121 51530-62

Areas of activity

  •     Micro- and Nanotechnology
  •     thin film technology
  •     Electron and ion beam technology
  •     Electron microscopy and microanalysis
  •     Vacuum and cryo technology

 

Justine Rehbronn
Scientist Nanoanalytics
T +49 (0)7121 51530-907
F +49 (0)7121 51530-16
Benedikt Reichel
Technical Assistant Interfaces and nanoanalytics
T +49 (0)7121 51530-57
F +49 (0)7121 51530-62
Dr. Birgit Schröppel
Scientist Nanoanalytics
T +49 (0)7121 51530-822
F +49 (0)7121 51530-62

Areas of interest   

  • FIB/SEM Crossbeam
  • cryomicroscopy
  • preparation methods
  • Analytics of biological-technical interfaces
  • electron microscopy

Stages of career

Since 2009 research associate in the Microsystems and Nanotechnology Group at the NMI

2011 PhD in Applied Physics on the development of an ion optical transfer system for a mass spectrometer

2004-2009 Research Assistant at the Institute of Applied Physics, Working Group Electron and Ion Optics

1997-2004 Study of physics at the Eberhard-Karls University Tübingen

 

 

Christian Simo
Technical Employee Nanoanalytics
T +49 (0)7121 515300
F +49 (0)7121 51530-62
Clementine Warres
Scientist Interfaces and nanoanalytics
T +49 (0)7121 51530-50
F +49 (0)7121 51530-62

Student Assistants

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